TY  - BOOK
AU  - Zhou,Weimin
ED  - SpringerLink (Online service)
TI  - Nanoimprint Lithography: An Enabling Process for Nanofabrication
SN  - 9783642344282
AV  - T174.7 
U1  - 620.5 23
PY  - 2013///
CY  - Berlin, Heidelberg
PB  - Springer Berlin Heidelberg, Imprint: Springer
KW  - Engineering
KW  - Nanochemistry
KW  - Nanotechnology
KW  - Optical materials
KW  - Electronic materials
KW  - Nanotechnology and Microengineering
KW  - Optical and Electronic Materials
N1  - Principles and statues of nanoimprint lithography -- Stamp Fabrication -- stamp surface treatment -- Nanoimprint lithography resists -- Nanoimprint lithography process -- Modeling and Simulation of NIL -- Application of NIL in Light emitting Diodes -- Application of NIL in memory devices -- Application of NIL in solar cell
N2  - Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China
UR  - http://dx.doi.org/10.1007/978-3-642-34428-2
ER  -