TY - BOOK AU - Mohan,Man ED - SpringerLink (Online service) TI - New Trends in Atomic and Molecular Physics: Advanced Technological Applications T2 - Springer Series on Atomic, Optical, and Plasma Physics, SN - 9783642381676 AV - QC170-197 U1 - 539 23 PY - 2013/// CY - Berlin, Heidelberg PB - Springer Berlin Heidelberg, Imprint: Springer KW - Physics KW - Atoms KW - Low temperature physics KW - Low temperatures KW - Spectroscopy KW - Microscopy KW - Nanotechnology KW - Materials science KW - Atomic, Molecular, Optical and Plasma Physics KW - Characterization and Evaluation of Materials KW - Spectroscopy and Microscopy KW - Low Temperature Physics KW - Nanotechnology and Microengineering N1 - From the Contents: Recent Investigations of Radiative Lifetimes and Transition Probabilities in Heavy Elements -- Atomic Structure calculations useful for Astrophysics and Fusion Plasma -- Highly Charged Ions in Rare Earth Permanent Magnet Penning Traps -- Dominance of Higher-Order Contributions to Electronic Recombination N2 - The field of Atomic and Molecular Physics (AMP) has reached significant advances in high–precision experimental measurement techniques. The area covers a wide spectrum ranging from conventional to new emerging multi-disciplinary areas like physics of highly charged ions (HCI), molecular physics, optical science, ultrafast laser technology etc. This book includes the important topics of atomic structure, physics of atomic collision, photoexcitation, photoionization processes, Laser cooling and trapping, Bose Einstein condensation and advanced technology applications of AMP in the fields of astronomy , astrophysics , fusion, biology and nanotechnology. This book is useful for researchers, professors, graduate, post graduate and PhD students dealing with atomic and molecular physics. The book has a wide scope with applications in neighbouring fields like plasma physics, astrophysics, cold collisions, nanotechnology and future fusion energy sources like ITER (international Thermonuclear Experimental Reactor) Tokomak plasma machine which need accurate AMP data UR - http://dx.doi.org/10.1007/978-3-642-38167-6 ER -