000 03670nam a22005177a 4500
001 sulb-eb0023660
003 BD-SySUS
005 20160413122401.0
007 cr nn 008mamaa
008 121025s2013 gw | s |||| 0|eng d
020 _a9783642273810
_9978-3-642-27381-0
024 7 _a10.1007/978-3-642-27381-0
_2doi
050 4 _aQC176-176.9
072 7 _aPNFS
_2bicssc
072 7 _aSCI077000
_2bisacsh
082 0 4 _a530.41
_223
100 1 _aHofmann, Siegfried.
_eauthor.
245 1 0 _aAuger- and X-Ray Photoelectron Spectroscopy in Materials Science
_h[electronic resource] :
_bA User-Oriented Guide /
_cby Siegfried Hofmann.
264 1 _aBerlin, Heidelberg :
_bSpringer Berlin Heidelberg :
_bImprint: Springer,
_c2013.
300 _aXX, 528 p.
_bonline resource.
336 _atext
_btxt
_2rdacontent
337 _acomputer
_bc
_2rdamedia
338 _aonline resource
_bcr
_2rdacarrier
347 _atext file
_bPDF
_2rda
490 1 _aSpringer Series in Surface Sciences,
_x0931-5195 ;
_v49
505 0 _aOutline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples).
520 _aTo anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.  .
650 0 _aPhysics.
650 0 _aSolid state physics.
650 0 _aSpectroscopy.
650 0 _aMicroscopy.
650 0 _aMaterials
_xSurfaces.
650 0 _aThin films.
650 1 4 _aPhysics.
650 2 4 _aSolid State Physics.
650 2 4 _aSpectroscopy and Microscopy.
650 2 4 _aSurfaces and Interfaces, Thin Films.
710 2 _aSpringerLink (Online service)
773 0 _tSpringer eBooks
776 0 8 _iPrinted edition:
_z9783642273803
830 0 _aSpringer Series in Surface Sciences,
_x0931-5195 ;
_v49
856 4 0 _uhttp://dx.doi.org/10.1007/978-3-642-27381-0
912 _aZDB-2-CMS
942 _2Dewey Decimal Classification
_ceBooks
999 _c45752
_d45752