000 | 03670nam a22005177a 4500 | ||
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001 | sulb-eb0023660 | ||
003 | BD-SySUS | ||
005 | 20160413122401.0 | ||
007 | cr nn 008mamaa | ||
008 | 121025s2013 gw | s |||| 0|eng d | ||
020 |
_a9783642273810 _9978-3-642-27381-0 |
||
024 | 7 |
_a10.1007/978-3-642-27381-0 _2doi |
|
050 | 4 | _aQC176-176.9 | |
072 | 7 |
_aPNFS _2bicssc |
|
072 | 7 |
_aSCI077000 _2bisacsh |
|
082 | 0 | 4 |
_a530.41 _223 |
100 | 1 |
_aHofmann, Siegfried. _eauthor. |
|
245 | 1 | 0 |
_aAuger- and X-Ray Photoelectron Spectroscopy in Materials Science _h[electronic resource] : _bA User-Oriented Guide / _cby Siegfried Hofmann. |
264 | 1 |
_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg : _bImprint: Springer, _c2013. |
|
300 |
_aXX, 528 p. _bonline resource. |
||
336 |
_atext _btxt _2rdacontent |
||
337 |
_acomputer _bc _2rdamedia |
||
338 |
_aonline resource _bcr _2rdacarrier |
||
347 |
_atext file _bPDF _2rda |
||
490 | 1 |
_aSpringer Series in Surface Sciences, _x0931-5195 ; _v49 |
|
505 | 0 | _aOutline of the Technique/Brief Description -- Theoretical Background -- Instrumentation -- Practical Surface Analysis with AES -- Data Evaluation/Quantification -- Problem Solving with AES (Examples). | |
520 | _aTo anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented. . | ||
650 | 0 | _aPhysics. | |
650 | 0 | _aSolid state physics. | |
650 | 0 | _aSpectroscopy. | |
650 | 0 | _aMicroscopy. | |
650 | 0 |
_aMaterials _xSurfaces. |
|
650 | 0 | _aThin films. | |
650 | 1 | 4 | _aPhysics. |
650 | 2 | 4 | _aSolid State Physics. |
650 | 2 | 4 | _aSpectroscopy and Microscopy. |
650 | 2 | 4 | _aSurfaces and Interfaces, Thin Films. |
710 | 2 | _aSpringerLink (Online service) | |
773 | 0 | _tSpringer eBooks | |
776 | 0 | 8 |
_iPrinted edition: _z9783642273803 |
830 | 0 |
_aSpringer Series in Surface Sciences, _x0931-5195 ; _v49 |
|
856 | 4 | 0 | _uhttp://dx.doi.org/10.1007/978-3-642-27381-0 |
912 | _aZDB-2-CMS | ||
942 |
_2Dewey Decimal Classification _ceBooks |
||
999 |
_c45752 _d45752 |